Ion-beam modification of colloidal silica particle masks to tailor the size of ordered arrays of Ag nanostructures produced by nanosphere lithography
- Reséndiz, E.
- Morales, U.
- Salinas, C.
- Graniel, O.
- López, L.M.
- Cheang-Wong, J.-C.
Actas:
Materials Research Society Symposium Proceedings
ISSN: 0272-9172
Ano de publicación: 2014
Volume: 1712
Tipo: Achega congreso